- All sections
- C - Chemistry; metallurgy
- C23C - Coating metallic material; coating material with metallic material; surface treatment of metallic material by diffusion into the surface, by chemical conversion or substitution; coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general
- C23C 16/515 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (CVD) processes characterised by the method of coating using electric discharges using pulsed discharges
Patent holdings for IPC class C23C 16/515
Total number of patents in this class: 169
10-year publication summary
16
|
9
|
10
|
13
|
16
|
11
|
16
|
14
|
15
|
6
|
2015 | 2016 | 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 |
Principal owners for this class
Owner |
All patents
|
This class
|
---|---|---|
Jiangsu Favored Nanotechnology Co., LTD | 145 |
14 |
Applied Materials, Inc. | 16587 |
12 |
Tokyo Electron Limited | 11599 |
11 |
Lam Research Corporation | 4775 |
10 |
International Business Machines Corporation | 60644 |
7 |
Honda Motor Co., Ltd. | 24537 |
6 |
Sio2 Medical Products, Inc. | 199 |
5 |
TRUMPF Huettinger Sp. z o.o. | 26 |
5 |
L'Air Liquide, Societe Anonyme pour l'Etude et l'Exploitation des Procedes Georges Claude | 3515 |
4 |
SCHOTT AG | 1675 |
4 |
NGK Insulators, Ltd. | 4589 |
3 |
ASM IP Holding B.V. | 1715 |
3 |
KHS Corpoplast GmbH | 167 |
3 |
The Procter & Gamble Company | 22178 |
2 |
Centre National de La Recherche Scientifique | 9632 |
2 |
Micron Technology, Inc. | 24960 |
2 |
Kyocera Corporation | 12735 |
2 |
Dowa Thermotech Co., Ltd. | 41 |
2 |
Ecole Polytechnique | 308 |
2 |
FUJIFILM Manufacturing Europe B.V. | 271 |
2 |
Other owners | 68 |